Experimental vacuum plasma equipment
Experimental vacuum plasma equipment
Experimental vacuum plasma equipment
|
Number |
Project |
Technical Parameter |
|
1 |
Specifications of the whole machine |
650mm(W) ×550mm(D)×450mm(H) |
|
2 |
Vacuum chamber specifications |
Imported aluminum200(W) ×200(H)×250(D)mm,10L |
|
3 |
Electrode plate specifications |
Specialized aluminum electrode150(L) × 150(W)mm |
|
4 |
vacuum pump system |
Mechanical rotary vane vacuum pump (external) |
|
5 |
Vacuum measurement system |
Pirani resistance vacuum gauge |
|
6 |
Gas metering system |
Adjustable float flow meter |
|
7 |
Number of gas pathways |
2 channels intake, 1 way venting |
|
8 |
Plasma generator |
40KHz，High frequency generator, 0-1000W adjustable |
|
9 |
Working gas |
2 working gas options available：Ar2、N2、H2、O2 |
|
Features |
1. High precision, fast response, good handling and compatibility, complete functions and professional technical support； 2. It is suitable for surface cleaning and activation of small products in university laboratories and semiconductor IC fields. |
|
|
Industry |
It is suitable for cameras and industries, mobile phone manufacturing, semiconductor IC fields, silica gel, plastics, polymer fields, automotive electronics industry, aviation industry, etc. |
|
|
Application |
1. Camera and fingerprint recognition industry: Oxidation removal on the surface of the gold PAD of the soft hard bonding board; IR surface cleaning and cleansing; 2. In the field of semiconductor ICs, COB, COG, COF, ACF processes are used for cleaning before wire bonding and soldering; 3. Silicone, plastic, and polymer fields: Surface roughening, etching, and activation of silicone, plastic, and polymer. |
|
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